LITHOGRAPHIC APPARATUS COMPRISING A SUPPORT, AN ARRAY OF INDIVIDUALLY CONTROLLABLE ELEMENTS, AND A PROJECTION SYSTEM

摘要

A lithographic apparatus comprising a support, an array of individually controllable elements, and a projection system are provided to improve a resolution pattern and flexibility. A supporting unit(IL) supports a patterning device modulating a beam of radiation in order to form a first modulation beam of radiation. An array of individually controllable elements(PD) modulates the first modulation beam of radiation to form a second modulation beam of radiation. A projection system(PS) projects the second modulation beam of radiation onto a substrate. A size of a portion of the radiation beam being projected onto the substrate corresponding to a minimum feature size of a pattern provided by the patterning device is smaller than that of a portion of the radiation beam being projected onto the substrate corresponding to the array of individually controllable elements.