<p>A wire discharge processing apparatus comprises a wire electrode (1), a processing power supply (5) that supplies a processing current between the wire electrode and a processed subject (2); first and second feeding elements (3A,3B) that feed the wire electrode; a first processing current loop that causes a first processing current to flow from the first feeding element toward the processed subject; a second processing current loop that causes a second processing current to flow from the second feeding element toward the processed subject; an impedance switching circuit (7A,7B) that is formed in at least one of the first and second processing current loops; and a control part (13) that changes the impedances of the impedance switching circuit, thereby controlling the shunting ratio between the first and second processing currents.</p>
申请公布号
WO2008050404(A1)
申请公布日期
2008.05.02
申请号
WO2006JP321178
申请日期
2006.10.24
申请人
MITSUBISHI ELECTRIC CORPORATION;HASHIMOTO, TAKASHI;ONODERA, YASUO;SATO, TATSUSHI;HATTORI, KOICHIRO;YAMADA, HISASHI