摘要 |
The invention is based on the object of improving the methods, which are hitherto known, for assessing the quality of glass surfaces and of designing the latter such that they can be applied for inline measurements. To this end, a method and an apparatus for determining the waviness of flat-glass substrates are provided, in which the deflection of light beams, which are transmitted by the substrate, at local deformations of the surface of the flat-glass substrate is detected in an optical and contactless manner and, using the detected deflection or at least a measurement variable resulting therefrom, the position and height of the local deformations are quantitatively determined, wherein the deflection values or variables derived therefrom are integrated over the measurement location in order to calculate the position and height of the local deformations. |
申请人 |
SCHOTT AG;OTTERMANN, CLEMENS;ORTNER, ANDREAS;GERSTNER, KLAUS |
发明人 |
OTTERMANN, CLEMENS;ORTNER, ANDREAS;GERSTNER, KLAUS |