发明名称 MASK AND DEPOSITION APPARATUS USING THE SAME
摘要 A mask and a deposition apparatus using the same are disclosed. One embodiment of the mask is used for depositing a thin film on the substrate having a plurality of sub-pixel regions. The mask includes a first region having a plurality of the first openings, each of which corresponds to one of the plurality of sub-pixel regions. The mask also includes second regions having a plurality of the second openings, each of which corresponds to at least two of the plurality of the sub-pixel regions. The second regions are positioned on both sides of the first region.
申请公布号 US2008100204(A1) 申请公布日期 2008.05.01
申请号 US20070743600 申请日期 2007.05.02
申请人 SAMSUNG SDI CO., LTD. 发明人 KIM TAE SEUNG
分类号 H01J1/62 主分类号 H01J1/62
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