发明名称 Self-aligned method of forming a semiconductor memory array of floating gate memory cells with source side erase, and a memory array made thereby
摘要 A method of forming an array of floating gate memory cells, and an array formed thereby, wherein each memory cell includes a substrate of semiconductor material having a first conductivity type, source and drain regions formed in the substrate, a block of conductive material disposed over and electrically connected to the source, and a floating gate having a first portion disposed over and insulated from the source region and a second portion disposed over and insulated from the channel region. The floating gate first portion includes a sloped upper surface and a side surface that meet at an acute edge. An electrically conductive control gate is disposed over and insulated from the channel region for controlling a conductivity thereof.
申请公布号 US2008099789(A1) 申请公布日期 2008.05.01
申请号 US20060592104 申请日期 2006.11.01
申请人 KOTOV ALEXANDER;LEVI AMITAY;NGUYEN HUNG Q;KLINGER PAVEL 发明人 KOTOV ALEXANDER;LEVI AMITAY;NGUYEN HUNG Q.;KLINGER PAVEL
分类号 H01L29/788;G11C16/04;H01L21/336;H01L21/82;H01L27/10 主分类号 H01L29/788
代理机构 代理人
主权项
地址