发明名称 |
Self-aligned method of forming a semiconductor memory array of floating gate memory cells with source side erase, and a memory array made thereby |
摘要 |
A method of forming an array of floating gate memory cells, and an array formed thereby, wherein each memory cell includes a substrate of semiconductor material having a first conductivity type, source and drain regions formed in the substrate, a block of conductive material disposed over and electrically connected to the source, and a floating gate having a first portion disposed over and insulated from the source region and a second portion disposed over and insulated from the channel region. The floating gate first portion includes a sloped upper surface and a side surface that meet at an acute edge. An electrically conductive control gate is disposed over and insulated from the channel region for controlling a conductivity thereof.
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申请公布号 |
US2008099789(A1) |
申请公布日期 |
2008.05.01 |
申请号 |
US20060592104 |
申请日期 |
2006.11.01 |
申请人 |
KOTOV ALEXANDER;LEVI AMITAY;NGUYEN HUNG Q;KLINGER PAVEL |
发明人 |
KOTOV ALEXANDER;LEVI AMITAY;NGUYEN HUNG Q.;KLINGER PAVEL |
分类号 |
H01L29/788;G11C16/04;H01L21/336;H01L21/82;H01L27/10 |
主分类号 |
H01L29/788 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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