发明名称 CONTROLLER FOR SUBSTRATE PROCESSING APPARATUS, CONTROL METHOD THEREFOR AND STORAGE MEDIUM STORING CONTROL PROGRAM
摘要 <p><P>PROBLEM TO BE SOLVED: To optimize a target value used as a control value in feedforward control. <P>SOLUTION: A TL 800 applies feedforward and feedback control to a PM 400. More specifically, a storage section 850 stores a plurality of recipes describing different processing procedures and a target value as a control value in applying etching process. A communication section 855 causes an IMM 600 to measure the processing status of a wafer W and receives measurement information. An operating section 865 calculates a feedback value of the wafer W processed this time, on the basis of the measurement information before and after the processing of the wafer W, and an updating section 870 updates the target valued, on the basis of the feedback value. A recipe adjusting section 875 changes a process to be executed in the same PM 400 by changing recipe. An access execution control section 880 subsequently uses the updated target value in executing the changed process and feedforward-controls the wafer W of the same PM 400. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008103632(A) 申请公布日期 2008.05.01
申请号 JP20060286676 申请日期 2006.10.20
申请人 TOKYO ELECTRON LTD 发明人 SAKANO SHINJI
分类号 H01L21/3065;H01L21/02;H01L21/205 主分类号 H01L21/3065
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