| 摘要 |
PROBLEM TO BE SOLVED: To obtain an exposure method, by which a line image pattern having a large size used in an electromagnetic wave shielding filter for PDP can be rapidly and efficiently drawn; and to provide an exposure device. SOLUTION: The exposure device is used for performing line image exposure on a photosensitive material intermittently transferred and has at least two exposure units 1,2 each having at least one exposure head. The exposure units 1,2 are arranged in the right and left so as to put the photosensitive material between them, and perform line image exposure while being provided so as to move on a two-dimensional plane in the transfer direction of the photosensitive material and the width direction of the photosensitive material orthogonal to the transfer direction of the photosensitive material. COPYRIGHT: (C)2008,JPO&INPIT
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