| 摘要 |
The present invention provides an exposure apparatus that can prevent the degradation of exposure and measurement accuracies. An exposure apparatus (EX) exposes a substrate (P) by irradiating the substrate (P) with exposure light (EL) through a projection optical system (PL) and a liquid (LQ), and comprises: a liquid supply mechanism ( 10 ) that supplies the liquid (LQ) between an optical element ( 2 ) at the image plane side tip part of the projection optical system (PL) and a substrate (P) that opposes the optical element ( 2 ); a timer ( 60 ) that measures the time that has elapsed since the supply of the liquid by the liquid supply mechanism ( 10 ) was started; and a control apparatus (CONT) that determines, based on a measurement result of the timer ( 60 ), whether a space(SP), which is between the optical element ( 2 ) and the substrate (P) and includes at least an optical path of the exposure light (EL), is filled with the liquid (LQ).
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