发明名称 |
DEVICE AND METHOD FOR DEFECT CORRECTION, AND PATTERN SUBSTRATE MANUFACTURING METHOD |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a device and a method for defect correction capable of improving productivity, and to provide a pattern substrate manufacturing method that uses them. <P>SOLUTION: The defect correction method includes irradiating defect on the pattern formed on a substrate 6 with a laser beam; a step of detecting defects on the pattern; a step of making a mask film 5, having an aperture 5a larger than the defect and the substrate 6 move relatively; a step of keeping the aperture 5a of the mask film 5 on the defect, after relatively moving them and bringing the aperture 5a into close contact with the substrate 6; and a step of removing the defects by irradiating the defect with the laser beam via the aperture 5a. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
申请公布号 |
JP2008102180(A) |
申请公布日期 |
2008.05.01 |
申请号 |
JP20060282520 |
申请日期 |
2006.10.17 |
申请人 |
LASERTEC CORP |
发明人 |
MORIIZUMI KOICHI;ISHIKAWA TAKUJI;TATSUMOTO TSUYOTAKA;YAMAZAKI TERUAKI;SEKI HIROKAZU |
分类号 |
G02F1/13;B23K26/00;B23K26/06;B23K101/40;G03F7/40 |
主分类号 |
G02F1/13 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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