| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure mask capable of preventing the occurrence of a defective chip while having no effect on the density of a device pattern, and to provide a method for manufacturing an electronic device and a method for inspecting an exposure mask. <P>SOLUTION: The exposure mask 21 has a transparent substrate 22, a light shielding zone 23 formed on the transparent substrate 22 so as to surround a rectangular shot region R<SB>s</SB>, a mask pattern 26 formed inside a circumferential scribe region R<SB>o</SB>bordering the shot region R<SB>s</SB>, and an inspection mark 25 formed on a first side 31 of the circumferential scribe region R<SB>o</SB>. A portion of the circumferential scribe region R<SB>o</SB>is designed to transmit exposure light, the portion corresponding to the inspection mark 25 after the mark is virtually moved parallel to a second side opposing to the first side by a distance corresponding to the shot interval. <P>COPYRIGHT: (C)2008,JPO&INPIT |
