SUBSTRATE PROCESSOR AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To reduce the contamination of a substrate, and simultaneously to quickly cool the substrate. SOLUTION: This substrate processor includes: a substrate holding tool 35 for holding a plurality of substrates 39; a treatment chamber 100 for holding the plurality of substrates 39 by the substrate holding tool 35, and for carrying out heat treatment; a preliminary chamber installed adjacently to the treatment chamber 100; and a heat exchanging part driving mechanism for inserting a heat exchanging part between the plurality of substrates 39 and 39 held by the substrate holding tool 35 in the preliminary chamber. COPYRIGHT: (C)2008,JPO&INPIT