发明名称 BACK IRRADIATION IMAGE SENSOR AND SEMICONDUCTOR SUBSTRATE
摘要 <P>PROBLEM TO BE SOLVED: To provide a back irradiation image sensor which can achieve separation of signal charge among different photoelectric conversion regions even when the depletion layer is made thick in the photoelectric conversion region. <P>SOLUTION: The back irradiation image sensor 100 which performs imaging by irradiating a p-substrate 30 from the back side and reading out charges generated in the p-substrate 30 in response to the light from the surface side of the p-substrate 30 comprises an n-type semiconductor layer 4 formed in the p-substrate 30 and storing the charges, and a p-type semiconductor layer 2 formed from the back side to the inside of the p-substrate wherein an n-type or p-type semiconductor layer or an i-type semiconductor layer having impurity concentration of 1.0&times;10<SP>14</SP>/cm<SP>3</SP>or less is included between the n-type semiconductor layer 4 and the p-type semiconductor layer 2. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008103554(A) 申请公布日期 2008.05.01
申请号 JP20060285194 申请日期 2006.10.19
申请人 FUJIFILM CORP 发明人 UIE SHINJI
分类号 H01L27/148;H01L31/10 主分类号 H01L27/148
代理机构 代理人
主权项
地址