| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition suitable as a resist having sensitivity with respect to far ultraviolet rays, represented by active radiation (for example, ArF excimer laser, EUV, electron beam, and so forth), a substrate with resist film, and a pattern forming method. <P>SOLUTION: The radiation-sensitive resin composition for use in a lithography process includes (A) a polymer, containing a structure represented by Formulae (1) and (B) a solvent. <P>COPYRIGHT: (C)2008,JPO&INPIT |
