| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a functional element capable of forming a plurality of functional layers with high alignment precision and capable of forming the functional element without giving damages to these functional layers. <P>SOLUTION: This is the manufacturing method of the functional element 28 in which the functional layer is film-formed on a substrate. The manufacturing method of the functional element 28 includes a process of film-forming a mask 16 on the rear side of a face of the substrate in which the functional layer is film-formed by using a transparent substrate 10 as the substrate, a process of film-forming the functional layer 20a on the functional layer film-forming face by photolithography wherein exposure is carried out via the mask, a process of removing one part of the mask and changing a pattern of the mask at least once, and a process of film-forming another functional layer on the functional layer film-forming face by the photolithography wherein exposure is carried out via the mask 22 in which the pattern is changed. <P>COPYRIGHT: (C)2008,JPO&INPIT |
