| 摘要 |
A method for forming a multilayered coating over a surface is disclosed. The method comprises providing a single source of precursor material and transporting the precursor material to a reaction location adjacent a surface to be coated. A first layer is deposited over the surface by chemical vapor deposition using the single source of precursor material, under a first set of reaction conditions. A second layer is deposited over the surface by chemical vapor deposition using the single source of precursor material, under a second set of reaction conditions. The first layer may have a predominantly polymeric component and the second layer may have a predominantly non-polymeric component. The chemical vapor deposition process may be plasma-enhanced and may be performed using a reactant gas. The precursor material may be an organo-silicon compound, such as a siloxane. The first and second layers may comprise various types of polymeric materials, such as silicone polymers, and various types of non-polymeric materials, such as silicon oxides. The multilayered coating may have various characteristics suitable for use with organic light-emitting devices, such as optical transparency, impermeability, and/or flexibility.
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