| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor probe having a projecting resistive tip and a manufacturing method for it. SOLUTION: The semiconductor probe is provided with a projection part 172 formed on a cantilever 170 to protrude and extend in a first direction crossing the longitudinal direction (a second direction) of the cantilever 170 at right angles, first and second electrode regions 132 and 134 formed separately from each other in the projection part 172, and the projecting resistive tip 130 formed on the projection part 172 to be positioned between the first and second electrode regions 132 and 134. The cantilever 170 is doped with first impurities, while the first and second electrode regions 132 and 134 and the resistive tip 130 are formed with second impurities having a polarity different from that of the first impurities. The resistive tip 130 is doped at a concentration lower than that for the first and second electrode regions 132 and 134. COPYRIGHT: (C)2008,JPO&INPIT |
