发明名称 SURFACE PRETREATMENT METHOD AND SURFACE PRETREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a surface pretreatment method and a surface pretreatment device capable of surely removing contaminant on a surface. SOLUTION: This surface pretreatment method/surface pretreatment device is provided with the first process for setting a sample in the device provided with a glow discharge light emitting means for exciting a particle emitted from the surface, in plasma, by making an inert gas ion generated with glow discharge collide with the surface of the sample, and for spattering the surface of the sample, the second process for measuring total light emitting amount FI emitted when the particle excited in the plasma returns to a ground state, the third process for calculating sequentially a primary differential value FI' and a secondary differential value FI'' while measuring the total light emitting amount FI, and the fourth process for stopping the spattering, when at least one out of an absolute value of the primary differential value FI' and an absolute value of the secondary differential value FI'' comes to the first threshold valueαor less at first after staring the measurement and when the other comes to the second threshold valueβ(0<α≤β) or less. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008102104(A) 申请公布日期 2008.05.01
申请号 JP20060287023 申请日期 2006.10.20
申请人 TOYOTA CENTRAL R&D LABS INC 发明人 SHIMAZU TAKASHI;SOFUGAWA HIDEO;HASEGAWA YORIKO;KOSAKA SATORU
分类号 G01N1/32;G01N21/67 主分类号 G01N1/32
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