发明名称 |
AMPOULE FOR LIQUID DRAW AND VAPOR DRAW WITH A CONTINOUS LEVEL SENSOR |
摘要 |
A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vaporizer coupled to the process chamber, or a vaporized or gaseous precursor material to the process chamber. The ampoule also includes a continuous level sensor to accurately monitor the level of precursor source material within the ampoule.
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申请公布号 |
US2008099933(A1) |
申请公布日期 |
2008.05.01 |
申请号 |
US20060554954 |
申请日期 |
2006.10.31 |
申请人 |
CHOI KENRIC T;NARWANKAR PRAVIN K;KHER SHREYAS S;NGUYEN SON T;DEATON PAUL;NGO KHAI;CHHABRA PAUL;OUYE ALAN H;WU DIEN-YEH DANIEL |
发明人 |
CHOI KENRIC T.;NARWANKAR PRAVIN K.;KHER SHREYAS S.;NGUYEN SON T.;DEATON PAUL;NGO KHAI;CHHABRA PAUL;OUYE ALAN H.;WU DIEN-YEH (DANIEL) |
分类号 |
F16K13/00;B01F3/04 |
主分类号 |
F16K13/00 |
代理机构 |
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代理人 |
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地址 |
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