| 摘要 |
<p>The method involves irradiating a photoresist layer applied on a substrate e.g. silicon plate, through a photomask. The layer is polmerized, and a non-polymerized layer is eliminated, where a remaining part of the layer constitutes a photoresist mold. A flat inserted element e.g. stone, is placed in the mold. A metallic layer is deposited by electroforming on the substrate such that development of the metallic layer surrounds the element. The substrate is separated from the electroformed layer that is integrated to the element and the mold is eliminated for obtaining a watch's part e.g. lever. The inserted element is made of plastic, ceramic, glass, metal or semiconductor material. An independent claim is also included for a part comprising a metallic part and an inserted element.</p> |
