发明名称 |
TRANSPARENT MICROPOROUS MATERIALS FOR CMP |
摘要 |
The invention is directed to a chemical-mechanical polishing pad substrate comprising a microporous closed-cell foam characterized by a narrow pore size distribution in the range of about 0.01 microns to about 10 microns. The polishing pad is produced by foaming a solid polymer sheet with a supercritical gas under an elevated temperature and pressure until the sheet is saturated with gas. The invention is further directed to a polishing pad comprising the polishing pad substrate, a method of polishing comprising the use of the polishing pad substrate, and a chemical-mechanical apparatus comprising the polishing pad substrate. |
申请公布号 |
EP1915233(A1) |
申请公布日期 |
2008.04.30 |
申请号 |
EP20060760366 |
申请日期 |
2006.05.24 |
申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
PRASAD, ABANESHWAR |
分类号 |
B24B37/04;B24B1/00;B24B29/00;B24B49/12;B24D3/32;B24D7/12;B24D13/12;H01L21/304 |
主分类号 |
B24B37/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|