| 摘要 |
<p>A processing apparatus (40) is provided with a process container (42) wherein a placing table is arranged for placing a subject to be processed; an exhaust system (64), which has vacuum pumps (70, 72) and a pressure control valve (68) for exhausting atmosphere in the process container (42); a gas jetting means (98), which is arranged inside the process container (42) and has a gas jetting port (102); and a gas supply means (100) for supplying a process gas to the gas jetting means (98). The entire processing apparatus (40) is controlled by a control means (114). The control means (114) controls the exhaust system (64) and the gas supply means (100). At the time of starting prescribed processing, the process gas of a flow quantity larger than a prescribed flow quantity is supplied for a short time, while exhausting the atmosphere in the process container (42) by the exhaust system (64), and then, the process gas of a prescribed flow quantity is supplied.</p> |
