发明名称 STRUCTURE AND APPARATUS FOR MEASURING CHARACTERISTICS OF ELECTRIC CONTACT THIN-FILM AND MANUFACTURING MATHOD THEREOF
摘要 A structure and an apparatus for measuring characteristics of an electric contact thin film, and a method for manufacturing the same are provided to improve reliability of a switch by manufacturing the switch with a selected contact thin film material. A structure for measuring characteristics of an electric contact thin film includes a first substrate(100), a first electric contact thin film(110), a second substrate(200), a protrusion unit(210), and a second electric contact thin film(220). The first electric contact thin film is formed on an upper part of the first substrate. The second substrate is located on a floating region from an upper part of the first electric contact thin film. The protrusion unit is formed on a lower part of the second substrate opposite to the first substrate. The second electric contact thin film wraps the protrusion unit and is formed on a lower part of the second substrate.
申请公布号 KR20080035126(A) 申请公布日期 2008.04.23
申请号 KR20060101358 申请日期 2006.10.18
申请人 LG ELECTRONICS INC. 发明人 KWON, HYOUK;CHOI, DONG JUNE;PARK, JAE HYOUNG;PARK, YONG HEE;KIM, YONG DAE
分类号 H01H13/715;H01H13/79;H01H13/807 主分类号 H01H13/715
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