发明名称 |
Stripper containing an acetal or a ketal for removing post-etched phot-resist, etch polymer and residue |
摘要 |
The current invention describes a formulation comprising of acetal or ketal as a solvent, a polyhydric alcohol, water and pH adjuster. These formulations should have a pH at least 7 or higher. Formulations in this invention can optionally contain watersoluble organic solvents as co-solvent, corrosion inhibitors and fluorides. The formulations in this invention can be used to remove post-etched organic and inorganic residue as well as polymeric residues from semiconductor substrates.
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申请公布号 |
EP1914296(A2) |
申请公布日期 |
2008.04.23 |
申请号 |
EP20070118852 |
申请日期 |
2007.10.19 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
EGBE, MATTHEW I.;LEGENZA, MICHAEL WALTER |
分类号 |
C11D17/00 |
主分类号 |
C11D17/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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