摘要 |
An apparatus and a method for aligning glass substrates are provided to align stages, glass substrates and masks quickly and exactly by minimizing the amount of movement of a glass substrate aligning apparatus for light exposure, thereby reducing the whole manufacturing process time. A measuring unit(40) measures a measurement value for a location of a glass substrate(G) mounted on a stage(S). A storage(50) stores the measurement value, and calculates a reference value having a range of upper and lower limits obtained by adding or subtracting a predetermined deviation to or from an average value of pre-measured measurement values. A comparing unit(30) compares the measurement value with the reference value. A control unit(20) aligns the glass substrate and the stage according to the result of the comparing unit. |