发明名称 |
Process for forming a feature by undercutting a printed mask |
摘要 |
<p>A print patterned mask is formed a digital lithographic process on the surface of a photoresist or similar material layer. The print patterned mask is then used as a development or etching mask, and the underlying layer overdeveloped or overetched to undercut the print patterned mask. The mask may be removed and the underlying structure used an etch mask or as a final structure. Fine feature widths, narrower the minimum width of the print patterned mask features, may be obtained while realizing the benefits of digital lithography in the manufacturing process.
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申请公布号 |
EP1906229(A3) |
申请公布日期 |
2008.04.23 |
申请号 |
EP20070100906 |
申请日期 |
2007.01.22 |
申请人 |
PALO ALTO RESEARCH CENTER INCORPORATED |
发明人 |
LIMB, SCOTT J.;WONG, WILLIAM S.;READY, STEVEN E.;CHABINYC, MICHAEL L. |
分类号 |
G03F1/00;G02F1/1335 |
主分类号 |
G03F1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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