| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method for an active matrix type liquid crystal display device wherein light leakage in the vicinity of a pixel electrode can be prevented. <P>SOLUTION: The manufacturing method comprises a stage for forming a wiring and then forming a transparent insulation film 20 on an array substrate 10, a stage for performing dry process etching of the insulation film so that the insulation film having film thickness whose ratio to the film thickness of the wiring is≥0.5 and≤1.0 is left on the surface on the wiring side and a stage for performing wet process etching of only the wiring having film thickness whose ratio to the film thickness of the wiring is≤0.2, in the active matrix type liquid crystal display device wherein array of liquid crystal molecules is changed by generating an electric field nearly parallel to the array substrate. <P>COPYRIGHT: (C)2003,JPO</p> |
