| 摘要 |
A chemical deposition apparatus for an electroluminescence device is provided to uniform the film quality of a passivation film by increasing the number of a gas outlet holes relative to the number of buffers. A chemical deposition apparatus includes a gas nozzle part(400) for forming a passivation film on an electroluminescence device. The gas nozzle part has a gas inlet port(401) introducing gas into the electroluminescence device, plural buffers(403) formed on the gas inlet port for accumulating the gas, plural gas blowing holes(405) blowing a predetermined quantity of the gas accumulated in the buffers during a given time, and plural gas outlet ports(407) discharging the gas onto the electroluminescence device. |
