发明名称 |
Method of forming a metal line and method of manufacturing display substrate having the same |
摘要 |
A method of forming a metal line is provided. A first metal layer and a second metal layer protecting the first metal layer are formed on a base substrate. The first metal layer includes aluminum or aluminum alloy. A photoresist pattern having a linear shape is formed on the second metal layer. The first and second metal layers are dry-etched using etching gas and the photoresist pattern as an etching mask. An etching material is removed from the base substrate, to prevent corrosion of the dry-etched first metal layer. Therefore, the source metal pattern without corrosion may be formed through a dry-etching process so that a manufacturing cost is decreased.
|
申请公布号 |
US7361606(B2) |
申请公布日期 |
2008.04.22 |
申请号 |
US20060564308 |
申请日期 |
2006.11.29 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
KIM SANG GAB;KIM SHI YUL;OH MIN SEOK;CHIN HONG KEE |
分类号 |
H01L21/302 |
主分类号 |
H01L21/302 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|