发明名称 Field effect transistor with buried gate pattern
摘要 A field effect transistor includes a buried gate pattern that is electrically isolated by being surrounded by a tunneling insulating film. The field effect transistor also includes a channel region that is floated by source and drain regions, a gate insulating film, and the tunneling insulating film. The buried gate pattern and the tunneling insulating film extend into the source and drain regions. Thus, the field effect transistor efficiently stores charge carriers in the buried gate pattern and the floating channel region.
申请公布号 US7361545(B2) 申请公布日期 2008.04.22
申请号 US20050241611 申请日期 2005.09.30
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LI MING;CHOI DONG-UK;OH CHANG-WOO;KIM DONG-WON;KIM MIN-SANG;KIM SUNG-HWAN;YEO KYOUNG-HWAN
分类号 H01L21/00 主分类号 H01L21/00
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