发明名称 |
Method for reducing damage to sliders during lapping |
摘要 |
A process is described for fabricating sliders with reduced lapping damage to the hard-bias materials. The stack of layers for the magnetic sensor is deposited on a wafer and patterned into an initial shape. The hard-bias structures are fabricated at the side of the magnetic sensor as in the prior art. In each of the two described embodiments of the invention, the hard-bias material below the ABS is reduced or removed and replaced with a fill material such as alumina. A first embodiment reduces the hard-bias material below the ABS by forming an extended lapping gap along the ABS in both the sensor and hard-bias material. A second embodiment forms a photoresist mask over the sensor and the portion of the hard-bias/lead structures above the ABS and the exposed hard-bias/lead material below the ABS is thinned or completely removed by milling.
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申请公布号 |
US7360296(B2) |
申请公布日期 |
2008.04.22 |
申请号 |
US20040957098 |
申请日期 |
2004.09.30 |
申请人 |
HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. |
发明人 |
CYRILLE MARIE-CLAIRE;KASIRAJ PRAKASH;TZENG HUEY-MING |
分类号 |
G11B5/187;B24B1/00 |
主分类号 |
G11B5/187 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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