发明名称 |
Showerheads for providing a gas to a substrate and apparatus |
摘要 |
Showerheads including a plate having a plurality of gas outlet holes extending therethrough and a head cover coupled to the plate to form a space between the plate and the head cover. A gas supply inlet member is configured to provide gas to the space directed toward the head cover. A gas distribution member on an inner face of the head cover facing the space is configured to partially suppress flow of the gas provided to the space in a direction along the gas distribution member to substantially uniformly distribute the gas in the space. The direction along the gas distribution member may be a horizontal direction and the gas provided to the space is directed in a substantially vertical upward direction. Apparatus and methods using the showerheads are also provided.
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申请公布号 |
US7361228(B2) |
申请公布日期 |
2008.04.22 |
申请号 |
US20050060525 |
申请日期 |
2005.02.17 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHOI YOUNG-BAE;LEE MOON-SOOK;BAE BYOUNG-JAE |
分类号 |
C23C16/455;H01L21/20;C23C16/00;C23F1/00;H01J37/32;H01L21/306 |
主分类号 |
C23C16/455 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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