发明名称 Showerheads for providing a gas to a substrate and apparatus
摘要 Showerheads including a plate having a plurality of gas outlet holes extending therethrough and a head cover coupled to the plate to form a space between the plate and the head cover. A gas supply inlet member is configured to provide gas to the space directed toward the head cover. A gas distribution member on an inner face of the head cover facing the space is configured to partially suppress flow of the gas provided to the space in a direction along the gas distribution member to substantially uniformly distribute the gas in the space. The direction along the gas distribution member may be a horizontal direction and the gas provided to the space is directed in a substantially vertical upward direction. Apparatus and methods using the showerheads are also provided.
申请公布号 US7361228(B2) 申请公布日期 2008.04.22
申请号 US20050060525 申请日期 2005.02.17
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHOI YOUNG-BAE;LEE MOON-SOOK;BAE BYOUNG-JAE
分类号 C23C16/455;H01L21/20;C23C16/00;C23F1/00;H01J37/32;H01L21/306 主分类号 C23C16/455
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