| 摘要 |
An image sensor and a manufacturing method thereof are provided to control the center shift of a focus and to increase the condensing rate of light at a light receiving region by differently forming a shape of a micro lens at every position of the light receiving region using a phase shift mask. A color filter array(20) is formed on a pixel array substrate(10) on which a light detecting unit is formed. A photoresist for a micro lens is applied to the color filter array. The photoresist is exposed and developed to form a lens pattern array having a lens pattern on which a step is formed. The lens pattern array is re-flowed to form a macro lens array(100) including different micro lenses(110,120,130). A thickness of the step of the lens pattern on the lens pattern array is the smallest in a center thereof. An exposure mask used for forming the lens pattern by exposing and developing the photoresist is a half tone shift phase mask.
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