发明名称 BACKSIDE SILICON WAFER DESIGN REDUCING IMAGE ARTIFACTS FROM INFRARED RADIATION
摘要 Imaging devices having reduced image artifacts are disclosed. The image artifacts in the imaging devices are reduced by redirecting, absorbing or scattering IR radiation that passes through the imaging device substrate away from dark pixels.
申请公布号 KR20080032004(A) 申请公布日期 2008.04.11
申请号 KR20087005293 申请日期 2006.07.27
申请人 MICRON TECHNOLOGY, INC. 发明人 AGRANOV GENNADIY A.;KARASEV IGOR
分类号 H01L27/146;H01L31/0236 主分类号 H01L27/146
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