METHOD FOR PLASMOCHEMICAL TREATMENT OF MATERIALS

摘要

A method for treatment of plasmochemical metal material consists in etching semi-conductive plates made in a cylindrical reactor, wherein plasma of high-frequency discharge is excited at low pressure of plasma-supporting gas by means of formation in reactor of high-frequency field with E intensity that cause appearance of plasma chemically active particles having N concentration. Plates are arranged in special plate holders at a distance h one from another. Moreover, the h distance is determined proportional to change of the ratio E/N.