| 摘要 |
PROBLEM TO BE SOLVED: To provide a solid observation method and an electron microscope capable of totally and accurately evaluating an electronic device structure or the like with a three-dimensional structure. SOLUTION: By measuring strengths of electron beams transmitting a sample 42 by changing a focal position of the electron beams in a depth direction of the sample 42 with the use of the electron microscope equipped with an electron gun 40 generating electron beams, a convergent lens 44 converging electron beams generated by the electron gun 40 to be incident into the sample 42, an image-formation lens 46 controlling scattering angles of the electron beams transmitting the sample 42, and a detector 20 for detecting the electron beams transmitting the sample 42, absorption of the electron beams by the sample 42 and a distribution of the scattering angles in a depth direction are measured. COPYRIGHT: (C)2008,JPO&INPIT
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