| 摘要 |
PROBLEM TO BE SOLVED: To uniformly deposit the evaporation particles of an evaporation flow on the lower face of a shutter body. SOLUTION: In the shutter 6 of a vacuum deposition system 1 interposed between a workpiece W and an evaporation material source 4 positioned so as to be confronted up and down within a vacuum chamber 2 and controlling an evaporation flow A from the evaporation material source 4, the shutter 6 comprises: a shutter body 103 composed freely movably between a shielding position facing to the evaporation flow A and shielding the same and a non-shielding position for retreating from the evaporation flow A; a shutter supporting member 62 supporting the shutter body; and a shutter motor 63 moving the shutter body 103 between the shielding position and the non-shielding position via the shutter supporting member 62, and the lower face of the shutter body 103 is formed, so as to be a shape obtained by copying the uniformly distributed curved face of the evaporation flow A. COPYRIGHT: (C)2008,JPO&INPIT
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