| 摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor fabrication device where the treatment of a functional member such as the member to be etched can be easily performed independently from the body to be treated. SOLUTION: A gate valve 31 for partitioning the inside of a chamber 1 is provided at a space to be stored with a substrate 3 and a space to be stored with the member 12 to be etched. By partitioning the inside of the chamber 1 where single treatment is performed using the gate valve 31, the treatment of the member 12 to be etched is performed regardless of the space to be stored with the substrate 3, and the fault of a vacuum apparatus 18 is eliminated, so as to improve its maintainability. COPYRIGHT: (C)2008,JPO&INPIT
|
