| 摘要 |
A resist protective coating material comprises a polymer comprising repeat units having formulae (1a) and (1b) and having a Mw of 1,000-500,000. R<SUP>1a </SUP>and R<SUP>1b </SUP>are H, F or alkyl or fluoroalkyl, R<SUP>2a</SUP>, R<SUP>2b</SUP>, R<SUP>3a </SUP>and R<SUP>3b </SUP>are H or alkyl, or R<SUP>2a </SUP>and R<SUP>2b</SUP>, and R<SUP>3a </SUP>and R<SUP>3b </SUP>may bond together to form a ring, 0<a<1, 0<b<1, a+b=1, and n=1 to 4. The protective coating material is improved in water repellency and water slip. In the ArF immersion lithography, it is effective in preventing water penetration and leaching of additives from the resist.
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