| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition capable of highly satisfying all of PEB temperature dependency, line edge roughness (LWR), dark/bright pattern profile difference and development defects, and a pattern forming method using the positive resist composition. <P>SOLUTION: The positive resist composition comprises (A) a resin containing a repeating unit (A1) having a lactone structure and a cyano group and a repeating unit (A2) having a lactone structure and no cyano group, and having solubility in an alkali developer increased by the action of an acid, (B) a compound capable generating an acid upon irradiation with an actinic ray or radiation and (C) a solvent. The pattern forming method using the positive resist composition is also provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
