| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive composition used for the process of producing a semiconductor such as an IC, production of a circuit substrate for a liquid crystal, a thermal head, and the like, other photofabrication processes, and the like, capable of reducing development defects also in forming a minute pattern of 100 nm or less with little fluctuation of the linewidth derived from a fluctuation of the focal position, and to provide a pattern forming method using the same. <P>SOLUTION: A photosensitive composition containing a compound for generating an acid by irradiation with a beam of active light or a radiation, a specific basic compound having a polar group, a specific basic compound having no polar groups, and a specific surfactant, and a pattern forming method using the same are provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
