INSPECTION METHOD AND DEVICE, LITHOGRAPHIC DEVICE, LITHOGRAPHIC PROCESSING CELL, AND DEVICE MANUFACTURING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a scatterometer capable of using a special illumination mode, for example, in a small target.

SOLUTION: A scatterometry device having an illumination aperture diaphragm is provided with a field diaphragm in an intermediate image to control a spot size on a substrate. The field diaphragm may be apodized, and has a trapezium or a Gaussian shape of transmittance.

COPYRIGHT: (C)2008,JPO&INPIT