| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide EUV light source equipment capable of preventing the generation efficiency of EUV light from decreasing due to the deterioration of the window of a chamber for generating EUV light. <P>SOLUTION: The EUV light source equipment comprises: a driver laser 1; an EUV light generation chamber 2; a window 6; an EUV light condensation mirror 8; a concave lens 41 for dispersing laser beams; a convex lens 42 for collimating the dispersed laser beams; a parabolic concave mirror 43 for reflecting the collimated laser beams for condensing on a target substance; a parabolic concave mirror adjustment mechanism 44 for adjusting the position and angle of the parabolic concave mirror 43; purge gas supply sections 31, 33 for supplying purge gas for protecting the window 6 and the parabolic concave mirror 43; purge gas introduction paths 33, 34 for introducing purge gas to the window 6 and the parabolic concave mirror 43; and a purge gas chamber 50 for surrounding the window 6 and the parabolic concave mirror 43. <P>COPYRIGHT: (C)2008,JPO&INPIT |
