| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a multilayered wafer of stacked thin films, a method of manufacturing the multilayered wafer, and an apparatus for inspecting the wafer, which can detect positional displacements between patterns of the layers with a small error amount and less fluctuations in direction, can detect the positional displacements in a short time with a simple arrangement, and can make small an occupied surface area of overlay markers on the multilayered thin films. <P>SOLUTION: Overlay markers 62a, 70a, 66a for detecting relative positional displacements between patterns 62, 66, 70 of layers are provided to each of the layers. The overlay markers 62a, 70a, 66a are provided so that from the observation position of the specific overlay marker 70a of at least one of the layers, the overlay markers 62a, 66a of the layers other than the at least one of the layers can be observed. <P>COPYRIGHT: (C)2008,JPO&INPIT |
