HEATING APPARATUS WITH ENHANCED THERMAL UNIFORMITY, AND METHOD FOR MAKING THEREOF

摘要

PROBLEM TO BE SOLVED: To generally provide a heating apparatus for providing a relatively uniform temperature distribution to a substrate in a semiconductor-processing chamber or for heating a metal or ceramic mold for press forming glass lenses.

SOLUTION: The heating apparatus for regulating/controlling the surface temperature of a substrate is provided. At least a pyrolytic graphite (TPG) layer is embedded in a heater to diffuse the temperature difference of various components in the heating apparatus and provides temporal and spatial control of the surface temperature of the substrate, for a relatively uniform substrate temperature with the difference between the maximum and minimum temperature points on the substrate of less than 10°C.

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