发明名称 MANUFACTURING METHOD OF ELECTRODE SUBSTRATE
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a method of manufacturing an electrode substrate having electrodes patterned and formed on both surfaces in good yield through simple stages. <P>SOLUTION: The method of manufacturing the electrode substrate having a plurality of first electrodes and a plurality of second electrodes patterned and formed on a first surface and a second surface forming the top and reverse surfaces of the substrate, includes: a stage ST01 of forming a polycrystalline ITO film on the first surface of the substrate; a stage ST04 of forming an amorphous ITO film on the second surface; a stage ST05 of forming the second electrodes on the second surface by patterning the amorphous ITO film by using an etching solution selectively removing the amorphous ITO film; a stage ST8 of forming a protective film covering the second electrodes; and a stage ST09 of forming the first electrodes by patterning the polycrystalline ITO film on the first surface. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008083497(A) 申请公布日期 2008.04.10
申请号 JP20060264508 申请日期 2006.09.28
申请人 EPSON IMAGING DEVICES CORP 发明人 MATSUO MUTSUMI
分类号 G02F1/1343;G06F3/041 主分类号 G02F1/1343
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