| 摘要 |
PROBLEM TO BE SOLVED: To attain cleaning of an end surface of a semiconductor substrate while generation of static electricity is controlled with a cleaning method of semiconductor substrate for cleaning the end surface of the semiconductor substrate. SOLUTION: The end surface 32 of the semiconductor substrate 21 is cleaned with a brush while a cleaning water 14 having the non-charging function is supplied to the front surface 21A and the end surface 32 of the semiconductor substrate 21. COPYRIGHT: (C)2008,JPO&INPIT
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