| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum film deposition system where useless evaporation particles can be shielded and catched by an easily attachable/detachable shielding plate with the minimum area. SOLUTION: Regarding the vacuum deposition system 1 where a workpiece W and an evaporation material source 4 are positioned so as to be confronted up and down in a vacuum chamber 2, the system is provided with: a shielding plate 61 arranged between the workpiece W and the evaporation material source 4, and regulating the diffusion range of an evaporation flow A from the evaporation material source 4 so as to correspond to the size of the workpiece W; and a shielding plate supporting mechanism 62 for supporting the shielding plate 61 freely attachably/detachably. The shielding plate 61 has an outer form corresponding to the maximum diffusion range of the evaporation flow A and further has an opening part corresponding to the regulated diffusion range. COPYRIGHT: (C)2008,JPO&INPIT
|
