Hair treatment application system comprising an absorbent substrate

摘要

The present invention describes a hair treatment application system, comprising at least one or more hair treatment compositions ( 15 ) having a viscosity of from 3,000 cPs to 150,000 cPs and a hair treatment application device ( 1 ) comprising a first plate ( 10 ) and a second plate ( 20 ) positionable in a juxtaposed relationship when said hair treatment application device ( 1 ) is in a closed state. The hair treatment application device ( 1 ) is characterized by having a first zone comprising at least one absorbent substrate ( 40 ) on the internal surface ( 101 ) of said at least said first plates ( 10 ) and a second zone ( 50 ) on said internal surface ( 101 ) which is free of said absorbent substrate ( 40 ). Said at least one absorbent substrate ( 40 ) has a median pore radius of from 300 microns to 3,000 micron. The present invention describes also methods of treating the hair with said hair treatment application system ( 10 ) and kit comprising said hair treatment application system.