发明名称 |
Lithographic apparatus, and device manufacturing method |
摘要 |
A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.
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申请公布号 |
US2008083885(A1) |
申请公布日期 |
2008.04.10 |
申请号 |
US20060544930 |
申请日期 |
2006.10.10 |
申请人 |
ASML NETHERLANDS B.V.;CARL ZEISS SMT AG |
发明人 |
WILHELMUS VAN HERPEN MAARTEN MARINUS JOHANNES;BANINE VADIM YEVGENYEVICH;DE KUSTER JOHANNES PETERUS HENRICUS;MOORS JOHANNES HUBERTUS JOSEPHINA;STEVENS LUCAS HENRICUS JOHANNES;WOLSCHRIJN BASTIAAN THEODOOR;SIDELNIKOV YURII VICTOROVITCH;VAN DER VELDEN MARC HUBERTUS LORENZ;SOER WOUTER ANTON;STEIN THOMAS;GIELISSEN KURT |
分类号 |
G21K5/00;G21G4/00 |
主分类号 |
G21K5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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