| 摘要 |
PROBLEM TO BE SOLVED: To provide an inexpensive and efficient method of treating a residual organic matter which allows operations to be safely processed in a work operation, treatments to be facilitated and no environment problems to be caused. SOLUTION: The method of treating a residual organic matter is provided with: a step of removing an altered layer, the step including plasma-treating a mixed gas made up of at least one of N<SB>2</SB>gas, O<SB>2</SB>gas, H<SB>2</SB>gas, water vapor and clean air under a pressure near the atmospheric pressure or a quasi ordinary pressure and removing the altered layer, the step including bringing the O radicals, the H radicals, the OH radicals or the N radicals into touch with a heated substrate to remove the altered layer produced on a surface of a resist; and a step of removing an unaltered layer, the step including falling-in-drops an ozone solution made by mixing an ozone water and a superheated water vapor, or only an ozone water, onto an organic matter including the resist to remove the unaltered layer of the resist under the altered layer. COPYRIGHT: (C)2008,JPO&INPIT
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